锆钇合金靶件性能对镀膜工艺影响研究

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Effect of Performance of Zr-Y Alloy Target on Thin Film Deposition Technology

National Key Laboratory for Nuclear Fuel and Materials, Nuclear Power Institute of China, Chengdu, 610041, China

摘要: 采用脉冲偏压电弧离子镀技术在不锈钢基片上制备氧化钇稳定的氧化锆(YSZ)薄膜。通过改变靶材成分均匀性和致密性,分析其对起弧性能、镀膜工艺稳定性的影响;使用金相显微镜(OM)、扫描电镜(SEM)和X射线衍射(XRD),对合金靶材及制备的YSZ涂层进行全面分析。结果表明,通过包覆热轧及退火热处理的合金靶材起弧性能好,镀膜工艺稳定,沉积的薄膜均匀、致密,组成为氧化钇和非晶氧化锆。
- YSZ /
- 电弧离子镀 /
- 锆钇合金
Abstract: Yttria-stabilized zirconia（YSZ） films are synthesized on corrosion resistant plates by pulsed bias arc ion plating.The arc starting performance and the stability of thin film deposition is explored by improving the uniformity and compactibility of Zr-Y alloy target.The property of Zr-Y alloy target and depositional thin films were measured with the optical microscope,scanning electron microscope,X-ray diffractometer.The result shows that the target with hot rolling and annealing has a good arc starting performance and stability of thin film deposition,and the depositional thin films made of Yttria and amorphous zirconia are homogeneous and compact.
- Yttria-stabilized zirconia（YSZ） /
- Arc ion plating /
- Zr-Y alloy