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非共格晶界及其偏析对3C-SiC在超临界二氧化碳中氧化影响的Reaxff-MD模拟

周起印 刘珠 张乐福 龙家琛 郭相龙

周起印, 刘珠, 张乐福, 龙家琛, 郭相龙. 非共格晶界及其偏析对3C-SiC在超临界二氧化碳中氧化影响的Reaxff-MD模拟[J]. 核动力工程, 2023, 44(5): 284-289. doi: 10.13832/j.jnpe.2023.05.0284
引用本文: 周起印, 刘珠, 张乐福, 龙家琛, 郭相龙. 非共格晶界及其偏析对3C-SiC在超临界二氧化碳中氧化影响的Reaxff-MD模拟[J]. 核动力工程, 2023, 44(5): 284-289. doi: 10.13832/j.jnpe.2023.05.0284
Zhou Qiyin, Liu Zhu, Zhang Lefu, Long Jiachen, Guo Xianglong. Reaxff-MD Simulation of the Effect of Incoherent Grain Boundaries and Its Segregation on Oxidation of 3C-SiC in Supercritical Carbon Dioxide[J]. Nuclear Power Engineering, 2023, 44(5): 284-289. doi: 10.13832/j.jnpe.2023.05.0284
Citation: Zhou Qiyin, Liu Zhu, Zhang Lefu, Long Jiachen, Guo Xianglong. Reaxff-MD Simulation of the Effect of Incoherent Grain Boundaries and Its Segregation on Oxidation of 3C-SiC in Supercritical Carbon Dioxide[J]. Nuclear Power Engineering, 2023, 44(5): 284-289. doi: 10.13832/j.jnpe.2023.05.0284

非共格晶界及其偏析对3C-SiC在超临界二氧化碳中氧化影响的Reaxff-MD模拟

doi: 10.13832/j.jnpe.2023.05.0284
基金项目: 超临界水冷堆核能系统材料与化学研发(2018YFE0116200)
详细信息
    作者简介:

    周起印(1995—),男,博士研究生,现主要从事核材料腐蚀失效方面的研究,E-mail: recovered@sjtu.edu.cn

    通讯作者:

    张乐福,E-mail: lfzhang@sjtu.edu.cn

  • 中图分类号: TL341

Reaxff-MD Simulation of the Effect of Incoherent Grain Boundaries and Its Segregation on Oxidation of 3C-SiC in Supercritical Carbon Dioxide

  • 摘要: 为理解SiC材料在超临界二氧化碳(sCO2)反应堆中的腐蚀失效机理,本文通过分子动力学模拟研究了3C-SiC在sCO2环境中的氧化行为,并深入探讨了非共格晶界处元素偏析对氧化的影响。结果显示,非共格晶界区域的氧化速度比单晶快,且硅元素或碳元素的偏析均会加剧非共格晶界处的氧化。非共格晶界的加速氧化归因于晶界区域内的未完全配位硅原子,这些硅原子更容易与氧原子成键。非共格晶界的元素偏析进一步加强了非共格晶界处SiC的氧化速度,其中硅元素的偏析使硅原子更难以完全配位,这导致晶界处有更多的硅原子带较低的正电荷,而碳元素的偏析则使得晶界处自由体积更大,氧原子可以与更深层的硅原子成键。本研究揭示了3C-SiC在sCO2中的腐蚀机理以及非共格晶界加速腐蚀的原因,为SiC材料在sCO2反应堆中的退化机制提供了理论支持。

     

  • 图  1  3C-SiC-sCO2模型

    Figure  1.  3C-SiC-sCO2 Model

    图  2  3C-SiC表面随模拟时间的发展

    Figure  2.  Development of 3C-SiC Surface with Simulation Time      

    图  3  单晶模型氧化层厚度的演化

    Figure  3.  Evolution of Oxide Layer Thickness in Single Crystal Model

    图  4  (100)单晶、(111)单晶、(100-111)双晶及Si晶界偏析、C晶界偏析的 (100-111)双晶模型氧化层厚度的演化

    Figure  4.  Evolution of Oxide Layer Thickness of (100) Single Crystal, (111) Single Crystal, (100-111) Bicrystal and Si GB Segregation, C GB Segregation of (100-111) Bicrystal Model

    图  5  氧化1 ns后双晶模型的原子构型图

    Figure  5.  Atomic Configuration Diagram of Bicrystal Model after 1 ns Oxidation

    图  6  双晶模型氧化层外沿O原子的坐标

    Figure  6.  Coordinates of O Atoms at the Outer Edge of Oxide Layer in Bicrystal

    图  7  双晶模型Si原子平均电荷与x坐标的关系

    Figure  7.  Relationship Between Average Charge of Si Atom and X Coordinate in Bicrystal Model

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出版历程
  • 收稿日期:  2022-11-18
  • 修回日期:  2023-01-04
  • 刊出日期:  2023-10-13

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